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Greeley, J. Neil

J. Neil Greeley

Education

PhD
Notre Dame, 1995

    About This Team Member

    Neil graduated from Notre Dame with his PhD in physical chemistry in the fall of 1995. His dissertation (w/ Dennis Jacobs) focused on studies of energy and electron transfer in ion/surface scattering experiments. He obtained his BS in chemistry from Santa Clara College in 1989.

    Neil was in charging of designing and building a new set of chambers for surface IR and LEED. He is shown below in front of the completed system. It is directly attached via a gate valve to our reactors and X-ray photoemission spectrometer.

    Neil completed a beautiful series of IR experiments of H8Si8O12 clusters on Si before moving on to Boise, Idaho.  He now works for Micron.

    Publications

    Investigation of Hydridosilsesquioxane-Based Silicon Oxide Deposition on Si(111)-7´7.

    K.S. Schneider, T. M. Owens, K. T. Nicholson, B. J. Ludwig, J. N. Greeley, B. G. Orr, M. M. Banaszak Holl.
    Langmuir
    2002,
    18,
    6233-6241.
    The Reaction of H8Si8O12 with a Chromium Oxide Surface: a model for stainless steel surface modification.
    J. N Greeley, S. Lee, M. M. Banaszak Holl.
    Appl. Organomet. Chem.
    1999,
    13,
    279-285.

    Infrared Study of H10Si10O15 Chemisorbed on Si(100)-2x1.

    J. N. Greeley, M. M. Banaszak Holl.
    Inorg. Chem.
    1998,
    37,
    6014-6017.

    Surface Infrared Studies of Silicon/Silicon Oxide Interfaces Derived from Hydridosilsesquioxane Clusters.

    J. N. Greeley, L. M. Meeuwenberg, M. M. Banaszak Holl.
    J. Am. Chem. Soc.
    1998,
    120,
    7776.

    The Role of Extra-Atomic Relaxation in Determining Si 2p Binding Energy Shifts at Silicon/Silicon Oxide Interfaces.

    K. Z. Zhang, J. N. Greeley, M. M. Banaszak Holl, F. R. McFeely.
    J. Appl. Phys.
    1997,
    82,
    2298.