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Band alignment issues related to HfO2/SiO2/p-Si gate...

Band alignment issues related to HfO2/SiO2/p-Si gate stacks.

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S. Sayan, T. Emge, E. Garfunkel, X.Zhao, L. Wielunksi, R. A. Bartynski, D. Vanderbilt, J.S. Suehle, S. Suzer, and M. Banaszak-Holl.
Journal of Applied Physics
2004,
96,
7485-7491.
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