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Self-limiting Chemical Vapor Deposition of an Ultra-thin...

Self-limiting Chemical Vapor Deposition of an Ultra-thin Silicon Oxide Film.

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K. A. Miller, C. John, K. Z. Zhang, K. T. Nicholson, F. R. McFeely, and M. M. Banaszak Holl.
Thin Solid Films
2001,
397,
78-82.