You Are Here: > Substrate-Selective Chemical Vapor Deposition of Gold...

Substrate-Selective Chemical Vapor Deposition of Gold...

Substrate-Selective Chemical Vapor Deposition of Gold from RAuP(CH3)3 (R = CH2CH3, CH3) at Temperatures Ranging from 25 to 400 °C.
M. M. Banaszak Holl, P. F. Seidler, S. P. Kowalczyk,F. R. McFeely.
Inorg. Chem.
1994,
33,
510.
See: